cmp planarization
equipment front end
CLEAR · 0–39
25/100 illustrative
CLEAR — equipment_front_end/cmp_planarization: diversified producer set with limited adversary/sanctions pressure in current graph.
4
Producers
0
Hostile
25
Adversary %
47
Scarcity
Adversary concentration25
Producer scarcity47
Sanctions exposure0
DoD path exposure28
Producers
| Track | Country | Score | Verdict | Actions |
|---|---|---|---|---|
| Hwatsing Technology | China | 57 | DEGRADED | Cascade |
| Applied Materials | United States | 37 | NOMINAL | Cascade |
| Ebara | Japan | 35 | NOMINAL | Cascade |
| KCTECH | South Korea | 31 | NOMINAL | Cascade |