CHOKEPOINT
MIXEDGraph 2026-08-10---- -- -- --:--:-- UTC
ENTITY · naura
Deal-Killer · Procurement Veto
NAURA Technology is itself sanctioned (BIS-EntityList).

NAURA Technology002371

China·etch·challenger·$77.3B mkt cap

China's largest domestic fab equipment maker across etch and deposition.

CRITICAL · 70–100
82/100 illustrative
Underwriting Thesis

CRITICAL — NAURA Technology is itself sanctioned (BIS-EntityList). A sanctioned node in the immediate supply path is a binary procurement risk that overrides all favorable factors.

Factor Breakdown
Foreign-Origin Concentration100
Sole-Source Dependence58
Sanctions Exposure100
Downstream Criticality60
Sanctions Exposure
BIS-EntityList
DoD Exposure

No matched DoD semiconductor awards (USASpending) for this entity.

Segments
etchdepositioncleaning
Shortest paths → DoD-exposed firms
  • GlobalFoundries · 1 hop · $1.05B
    NAURA Technology → GlobalFoundries
  • Marvell Technology · 2 hops · $184.3M
    NAURA Technology → TSMC → Marvell Technology
  • Valens Semiconductor · 2 hops · $28.3M
    NAURA Technology → TSMC → Valens Semiconductor
  • Scale AI · 3 hops · $105.6M
    NAURA Technology → SMIC → NVIDIA → Scale AI
Chokepoint Relationships

Key Suppliers · upstream · 0

No mapped upstream suppliers.

Key Customers · downstream · 8

Data Provenance· generated 2026-08-10 01:06:49Z
  • Consolidated Screening List (CSL) [LIVE] https://data.trade.gov/downloadable_consolidated_screening_list/v1/consolidated.json @ 2026-08-10T01:06:49.039Z
  • USASpending.gov — DoD award search [LIVE] https://api.usaspending.gov/api/v2/search/spending_by_award/ @ 2026-08-10T01:06:49.377Z
  • Curated ownership aggregation [FALLBACK] @ 2026-08-10T01:06:49.378Z
  • Curated China-ecosystem + Nexperia edges (Phase B, CSET ETO + TechInsights + TrendForce + SCMP + BIS Entity List + Nexperia press release) [FALLBACK] @ 2026-08-10T01:06:49.378Z

Firm/commodity-level signals from public data — not component-level BOM. Scores are an analytic underwriting heuristic, not legal or procurement advice.