SUBSTITUTES
Alternative producers in overlapping segments/subsegments — ranked by lower chokepoint score. Sanctioned peers sink to the bottom.
KCTECH
Keys: equipment front end · equipment front end/cleaning · equipment front end/cmp planarization
| Candidate | Country | Score | Verdict | Overlap | |
|---|---|---|---|---|---|
| ClassOne Technology | United States | 26 | CLEAR | equipment front end/cleaning | Compare › |
| ACM Research | United States | 27 | CLEAR | equipment front end/cleaning | Compare › |
| PSK Inc | South Korea | 31 | CLEAR | equipment front end/cleaning | Compare › |
| SEMES | South Korea | 34 | CLEAR | equipment front end/cleaning | Compare › |
| Ebara | Japan | 35 | CLEAR | equipment front end/cmp planarization | Compare › |
| Applied Materials | United States | 37 | CLEAR | equipment front end/cmp planarization | Compare › |
| Lam Research | United States | 37 | CLEAR | equipment front end/cleaning | Compare › |
| Tokyo Electron | Japan | 37 | CLEAR | equipment front end/cleaning | Compare › |
| SCREEN Holdings | Japan | 37 | CLEAR | equipment front end/cleaning | Compare › |
| Hwatsing Technology | China | 57 | WATCH | equipment front end/cmp planarization | Compare › |
| ●NAURA Technology | China | 82 | CRITICAL | equipment front end/cleaning | Compare › |
| ●Kingsemi | China | 82 | CRITICAL | equipment front end/cleaning | Compare › |