sputtering targets
materials
CLEAR · 0–39
11/100 illustrative
CLEAR — materials/sputtering_targets: diversified producer set with limited adversary/sanctions pressure in current graph.
10
Producers
0
Hostile
10
Adversary %
11
Scarcity
Adversary concentration10
Producer scarcity11
Sanctions exposure0
DoD path exposure28
Producers
| Track | Country | Score | Verdict | Actions |
|---|---|---|---|---|
| Solar Applied Materials | Taiwan | 48 | DEGRADED | Cascade |
| Ningbo Jiangfeng Electronic Material (Konfoong) | China | 40 | DEGRADED | Cascade |
| JX Advanced Metals | Japan | 37 | NOMINAL | Cascade |
| Tanaka Precious Metals | Japan | 36 | NOMINAL | Cascade |
| Sumitomo Metal Mining | Japan | 35 | NOMINAL | Cascade |
| Tosoh | Japan | 34 | NOMINAL | Cascade |
| Heraeus | Germany | 34 | NOMINAL | Cascade |
| Mitsubishi Materials | Japan | 34 | NOMINAL | Cascade |
| Ferrotec | Japan | 32 | NOMINAL | Cascade |
| Materion | United States | 30 | NOMINAL | Cascade |